CMPro-P Series Polypropyene Membrane Pleated Depth Filter

CMPro-P series cartridges consist of a pleated multi-layer gradient polypropylene membrane with a polypropylene cage. Ideal for the removal of large particles and colloids from chemical mechanical polishing (CMP) fluids, this series is particularly suited to the filtration of grinding fluids used in oxide, tungsten metal and copper metal CMP processes. It effectively removes agglomerated particles and colloidal impurities from slurry. In addition, the wide, deep fold design of the CMPro-P cartridge dramatically increases the filtration area and dirt-holding capacity, resulting in ultra-low pressure loss and long service life.
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Features

  • Wide and deep pleated structure for ultra-low pressure loss and longer service life.
  • Large filtration area, combined with continuously tapered pore minimizes shear pressure.
  • Tapered pore structure achieves interception of large particles and release of valid abrasives.
  • Manufactured, tested and packaged in clean room to ensure product cleanliness.
  • Applying hot melt welding technology to ensure no pollution.

Applications

 

 

Technical Parameters

Materials Fiter  Layers/Support Polypropylene
CagelCore/End  Cap Polypropylene
O-ring EPDM,FKM
Removal Rating 0.1μm,0.2μm,0.5μm,1.0μm,1.5μm,3.0μm,5.0μm,10.0μm
Dimensions Outer Diameter 68mm
Lengths 5-40inch
Max.Operating Conditions Max.Forward Diferential Pressure 0.52 MPa (75 psi) @ 25 ˚C (77 ˚F)
0.19 MPa (27 psi) @ 82 ˚C (179 ˚F)
Max.Reverse Differential Pressure 0.21 MPa (30 psi) @ 25 ˚C (77 ˚F)
Max.Operating Temperature 80 ˚C (176 ˚F)

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