The competitive nature of today’s microelectronics industry means that new expansions and technology advancements require speedy implementation without compromise of quality. MS is your specialist in meeting your ultrapure water requirements for the cleaning of process equipment, wafer cleaning and rinsing, and a host of other application.
MS RO system (skid) is based on the key technology of RO membrane, and combines with UF, MF, EDI/IX, Activated Carbon Filter and UV equipment to effectively remove organic matter, TOC, salt ions of raw water. It’s applied to the production process of microelectronics and industry in the world, and the production water is up to the semiconductor standards of E-1 to E-4 water requirements.
MS is a leading provider of Ultrapure water systems and services to the cosmetics, electronics, semiconductor and university markets. Each client has a unique set of requirements, like high volume or economical performance. MS RO skids help companies maintain profits by meeting water production requirements, as well as, controlling capital and operating expenses.
Parameter | Type E-1 | Type E-1.1 | Type E-1.2 | Type E-2 | Type E-3 | Type E-4 |
Linewidth(microns) | 1.0-5.0 | 0.35-0.25 | 0.18-0.09 | 5.0-1.0 | >5.0 | — |
Resistivity /MΩ*cm@25℃(On-line) | 18.1 | 18.2 | 18.2 | 16.5 | 12 | 0.5 |
TOC(μg/L) (on-line for ≤10ppb) | 5 | 2 | 1 | 50 | 300 | 1000 |
On-line dissolved oxygen(μg/L) | 25 | 10 | 3 | — | — | — |
On-line Residue after evaporation (μg/L) | 1 | 0.5 | 0.1 | — | — | — |
On-line Particles/L(micron range) | ||||||
0.05-0.1 | 1000 | 200 | — | — | — | |
0.1-0.2 | 1000 | 350 | <100 | — | — | — |
0.2-0.5 | 500 | <100 | <10 | — | — | — |
0.5-1.0 | 200 | <50 | <5 | — | — | — |
1 | <100 | <20 | <1 | — | — | — |
SEM Particles/L(micron range) | ||||||
0.1-0.2 | 1000 | 700 | <250 | — | — | — |
0.2-0.5 | 500 | 400 | <100 | 3000 | — | — |
0.5-1 | 100 | 50 | <30 | — | 10000 | — |
10 | <50 | <30 | <10 | — | — | 100000 |
Bacteria in CFU/Volume | ||||||
100mL Sample | 5 | 3 | 1 | 10 | 50 | 100 |
1L Sample | 10 | |||||
Silica-total(μg/L) | 5 | 3 | 1 | 10 | 50 | 1000 |
Silica-dissolved(μg/L) | 3 | 1 | 0.5 | — | — | — |
Anions and Ammonium by IC(μg/L) | ||||||
Ammonium | 0.1 | 0.1 | 0.05 | — | — | — |
Bromide | 0.1 | 0.05 | 0.02 | — | — | — |
Chloride | 0.1 | 0.05 | 0.02 | 1 | 10 | 1000 |
Fluoride | 0.1 | 0.05 | 0.03 | — | — | — |
Nitrate | 0.1 | 0.05 | 0.02 | 1 | 5 | 500 |
Nitrate | 0.1 | 0.05 | 0.02 | — | — | — |
Phosphate | 0.1 | 0.05 | 0.02 | 1 | 5 | 500 |
Sulfate | 0.1 | 0.05 | 0.02 | 1 | 5 | 500 |
Metals by ICP/MS(μg/L) | ||||||
Aluminum | 0.05 | 0.02 | 0.005 | — | — | — |
Barium | 0.05 | 0.02 | 0.001 | — | — | — |
Boron | 0.3 | 0.1 | 0.05 | — | — | — |
Calcium | 0.05 | 0.02 | 0.002 | — | — | — |
Chromium | 0.05 | 0.02 | 0.002 | — | — | — |
Copper | 0.05 | 0.02 | 0.002 | 1 | 2 | 500 |
Iron | 0.05 | 0.02 | 0.002 | — | — | — |
Lead | 0.05 | 0.02 | 0.005 | — | — | — |
Lithium | 0.05 | 0.02 | 0.003 | — | — | — |
Magnesium | 0.05 | 0.02 | 0.002 | — | — | — |
Manganese | 0.05 | 0.02 | 0.002 | — | — | — |
Nickel | 0.05 | 0.02 | 0.002 | 1 | 2 | 500 |
Potassium | 0.05 | 0.02 | 0.005 | 2 | 5 | 500 |
Sodium | 0.05 | 0.02 | 0.005 | 1 | 5 | 1000 |
Strontium | 0.05 | 0.02 | 0.001 | — | — | — |
Zinc | 0.05 | 0.02 | 0.002 | 1 | 5 | 500 |
Membrane Filtration Package System