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Lab Filtration
Lab Instrument
Industry Liquid Filtration

MS UltraPure Water RO System--For Microelectronics Industry

   

Introduction

The competitive nature of today’s microelectronics industry means that new expansions and technology advancements require speedy implementation without compromise of quality. MS is your specialist in meeting your ultrapure water requirements for the cleaning of process equipment, wafer cleaning and rinsing, and a host of other application.
MS RO system (skid) is based on the key technology of RO membrane, and combines with UF, MF, EDI/IX, Activated Carbon Filter and UV equipment to effectively remove organic matter, TOC, salt ions of raw water. It’s applied to the production process of microelectronics and industry in the world, and the production water is up to the semiconductor standards of E-1 to E-4 water requirements. 

Skids Features

  • High efficiency, high water recovery designs
  • State of the art manufacturing designs for easier operation
  • Manufactured in an ISO 9001 and GMP facility
  • Compact design for small footprint, less instruments, simple piping & installation
  • Cost effective standard water system platforms
  • Multiple platforms with RO/UF technology

Available Options

  • Ozone Disinfection Systems
  • Media Filtration
  • Water Softeners
  • Carbon Filters
  • Reverse Osmosis
  • Depth/Pleated Filtration
  • PLC Control Systems
  • Electrodeionization
  • Service Deionization
  • Ultrafiltration
  • Ultraviolet Purifiers
  • Cleaners & Sterilants

Ultrapure Water Standards in Microelectronics Industry

MS is a leading provider of Ultrapure water systems and services to the cosmetics, electronics, semiconductor and university markets. Each client has a unique set of requirements, like high volume or economical performance. MS RO skids help companies maintain profits by meeting water production requirements, as well as, controlling capital and operating expenses.

Parameter Type E-1 Type E-1.1 Type E-1.2 Type E-2 Type E-3 Type E-4
Linewidth(microns) 1.0-5.0 0.35-0.25 0.18-0.09 5.0-1.0 >5.0
Resistivity /MΩ*cm@25℃(On-line) 18.1 18.2 18.2 16.5 12 0.5
TOC(μg/L) (on-line for ≤10ppb) 5 2 1 50 300 1000
On-line dissolved oxygen(μg/L) 25 10 3
On-line Residue after evaporation (μg/L) 1 0.5 0.1
On-line Particles/L(micron range)
0.05-0.1   1000 200
0.1-0.2 1000 350 <100
0.2-0.5 500 <100 <10
0.5-1.0 200 <50 <5
1 <100 <20 <1
SEM Particles/L(micron range)
0.1-0.2 1000 700 <250
0.2-0.5 500 400 <100 3000
0.5-1 100 50 <30 10000
10 <50 <30 <10 100000
Bacteria in CFU/Volume            
100mL Sample 5 3 1 10 50 100
1L Sample     10      
Silica-total(μg/L) 5 3 1 10 50 1000
Silica-dissolved(μg/L) 3 1 0.5
Anions and Ammonium by IC(μg/L)
Ammonium 0.1 0.1 0.05
Bromide 0.1 0.05 0.02
Chloride 0.1 0.05 0.02 1 10 1000
Fluoride 0.1 0.05 0.03
Nitrate 0.1 0.05 0.02 1 5 500
Nitrate 0.1 0.05 0.02
Phosphate 0.1 0.05 0.02 1 5 500
Sulfate 0.1 0.05 0.02 1 5 500
Metals by ICP/MS(μg/L)
Aluminum 0.05 0.02 0.005
Barium 0.05 0.02 0.001
Boron 0.3 0.1 0.05
Calcium 0.05 0.02 0.002
Chromium 0.05 0.02 0.002
Copper 0.05 0.02 0.002 1 2 500
Iron 0.05 0.02 0.002
Lead 0.05 0.02 0.005
Lithium 0.05 0.02 0.003
Magnesium 0.05 0.02 0.002
Manganese 0.05 0.02 0.002
Nickel 0.05 0.02 0.002 1 2 500
Potassium 0.05 0.02 0.005 2 5 500
Sodium 0.05 0.02 0.005 1 5 1000
Strontium 0.05 0.02 0.001
Zinc 0.05 0.02 0.002 1 5 500

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