MS UltraPure Water RO System--For Microelectronics Industry

Introduction

The competitive nature of today’s microelectronics industry means that new expansions and technology advancements require speedy implementation without compromise of quality. MS is your specialist in meeting your ultrapure water requirements for the cleaning of process equipment, wafer cleaning and rinsing, and a host of other application.
MS RO system (skid) is based on the key technology of RO membrane, and combines with UF, MF, EDI/IX, Activated Carbon Filter and UV equipment to effectively remove organic matter, TOC, salt ions of raw water. It’s applied to the production process of microelectronics and industry in the world, and the production water is up to the semiconductor standards of E-1 to E-4 water requirements.

Skids Features

High efficiency, high water recovery designs
State of the art manufacturing designs for easier operation
Manufactured in an ISO 9001 and GMP facility
Compact design for small footprint, less instruments, simple piping & installation
Cost effective standard water system platforms
Multiple platforms with RO/UF technology

Available Options

Ozone Disinfection Systems
Media Filtration
Water Softeners
Carbon Filters
Reverse Osmosis
Depth/Pleated Filtration
PLC Control Systems
Electrodeionization
Service Deionization
Ultrafiltration
Ultraviolet Purifiers
Cleaners & Sterilants

Ultrapure Water Standards in Microelectronics Industry

MS is a leading provider of Ultrapure water systems and services to the cosmetics, electronics, semiconductor and university markets. Each client has a unique set of requirements, like high volume or economical performance. MS RO skids help companies maintain profits by meeting water production requirements, as well as, controlling capital and operating expenses.

Parameter	Type E-1	Type E-1.1	Type E-1.2	Type E-2	Type E-3	Type E-4
Linewidth(microns)	1.0-5.0	0.35-0.25	0.18-0.09	5.0-1.0	＞5.0	—
Resistivity /MΩ*cm@25℃(On-line)	18.1	18.2	18.2	16.5	12	0.5
TOC(μg/L) (on-line for ≤10ppb)	5	2	1	50	300	1000
On-line dissolved oxygen(μg/L)	25	10	3	—	—	—
On-line Residue after evaporation (μg/L)	1	0.5	0.1	—	—	—
On-line Particles/L(micron range)
0.05-0.1		1000	200	—	—	—
0.1-0.2	1000	350	＜100	—	—	—
0.2-0.5	500	＜100	＜10	—	—	—
0.5-1.0	200	＜50	＜5	—	—	—
1	＜100	＜20	＜1	—	—	—
SEM Particles/L(micron range)
0.1-0.2	1000	700	＜250	—	—	—
0.2-0.5	500	400	＜100	3000	—	—
0.5-1	100	50	＜30	—	10000	—
10	＜50	＜30	＜10	—	—	100000
Bacteria in CFU/Volume
100mL Sample	5	3	1	10	50	100
1L Sample			10
Silica-total(μg/L)	5	3	1	10	50	1000
Silica-dissolved(μg/L)	3	1	0.5	—	—	—
Anions and Ammonium by IC(μg/L)
Ammonium	0.1	0.1	0.05	—	—	—
Bromide	0.1	0.05	0.02	—	—	—
Chloride	0.1	0.05	0.02	1	10	1000
Fluoride	0.1	0.05	0.03	—	—	—
Nitrate	0.1	0.05	0.02	1	5	500
Nitrate	0.1	0.05	0.02	—	—	—
Phosphate	0.1	0.05	0.02	1	5	500
Sulfate	0.1	0.05	0.02	1	5	500
Metals by ICP/MS(μg/L)
Aluminum	0.05	0.02	0.005	—	—	—
Barium	0.05	0.02	0.001	—	—	—
Boron	0.3	0.1	0.05	—	—	—
Calcium	0.05	0.02	0.002	—	—	—
Chromium	0.05	0.02	0.002	—	—	—
Copper	0.05	0.02	0.002	1	2	500
Iron	0.05	0.02	0.002	—	—	—
Lead	0.05	0.02	0.005	—	—	—
Lithium	0.05	0.02	0.003	—	—	—
Magnesium	0.05	0.02	0.002	—	—	—
Manganese	0.05	0.02	0.002	—	—	—
Nickel	0.05	0.02	0.002	1	2	500
Potassium	0.05	0.02	0.005	2	5	500
Sodium	0.05	0.02	0.005	1	5	1000
Strontium	0.05	0.02	0.001	—	—	—
Zinc	0.05	0.02	0.002	1	5	500

MS UltraPure Water RO System--For Microelectronics Industry

Introduction

Skids Features

Available Options

Ultrapure Water Standards in Microelectronics Industry

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