
Photolithography
Photolithography technology refers to the technology of transferring the pattern on the mask plate to the substrate with the help of photoresist under the action of light (generally ultraviolet light, deep ultraviolet light, extreme ultraviolet light). The photolithography technology is one of the most important processes in semiconductor manufacturing. The cost is about 1/3 of the whole silicon wafer manufacturing process, and the time consumption accounts for about 40%~60% of the whole silicon wafer manufacturing process. In the field of semiconductor manufacturing, as the line width of semiconductor processing becomes smaller and smaller, the photolithography process is extremely strict on the control of minimal pollutants. It not only strictly controls particles, but also has strict requirements on low precipitates. Membrane Solutions uses advanced equipment and processes to produce products with excellent filtration efficiency, cleanliness and chemical resistance to cope with different SEMI photolithography process applications.
Photolithography Technology:
Process Technology | Membrane Solutions Recommended Filter Cartridge Series |
Photoresist Filtration | Photo-Unix Series UPE Pleated Filter Cartridge for Photoresist, Organic Solvents and Other Processes |
Photo-Novel Series -Filter Cartridge for Photoresist, Organic Solvents and Other Processes | |
FilterPhotoPure-PR Three-point Capsule Filter for Lithography Process | |
EPC/EHC Series PTFE/UPE/Nylon/PES Capsule Filter |
For detailed technical solutions and product series information, please contact your MS sales engineer.
Products About Photolithography
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EPC/EHC Capsule Filter
EPC/EHC Series Capsule Filter includes various filtering media, removal ratings, filtering area, and adaptor types and sizes to meet different operating conditions. The Capsule Filter is thermally welded into the housing without any adhesive, ensuring no risk of fiber shedding. This compact structure is easy to replace, reducing operator contact with solvents during operation and significantly enhancing safety.
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EPC/EHC Capsule Filter
EPC/EHC Series Capsule Filter includes various filtering media, removal ratings, filtering area, and adaptor types and sizes to meet different operating conditions. The Capsule Filter is thermally welded into the housing without any adhesive, ensuring no risk of fiber shedding. This compact structure is easy to replace, reducing operator contact with solvents during operation and significantly enhancing safety.
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Photo-Novel Series -Filter Cartridge for Photoresist, Organic Solvents and Other Processes
Membrane Solutions Photo-Novel series Nylon filters have high flow rate performance, good retention rate and excellent organic cleanliness. It is especially designed for photoresists, solvent and other chemicals in SEMI-Photo processes.The Nylon membrane used in Photo-Unix series filters is naturally hydrophilic nylon materials. It possesses low metal and particle cleanliness, and most important is the very low level of organic extraction.
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Photo-Unix Series - UPE Pleated Filter Cartridge for Photoresist, Organic Solvents and Other Processes
Membrane Solutions Photo-Unix series UPE filters have a large range removal ratings from 2nm to 0.2μm. Cartridge filters ensure excellent retention capabilities, cleanliness and high chemical compatibility to meet the critical demands in SEMI-Phot processes. The UPE membrane materials ensues cleanliness, low particle shedding and eliminates contaminants, thereby improving removal efficiency. In addition, the filter’s large membrane surface area provides high flow rate and extended service lifetime.
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PhotoPure-PR Capsule Filter
The PhotoPure-PR series filters are designed for terminal filtration of photoresists and inks. The triple-port capsule design ensures clean and convenient use and replacement of filters. Compatible with different filter membranes and removal ratings, it meets various filtration requirements.