Electronic Chemical

Wet electronic chemicals, also known as ultra‑clean high‑purity electronic chemicals, belong to the branch of electronic chemicals. They are various liquid chemical materials used in wet process steps (mainly including wet etching, cleaning, developing, stripping, etc.) in microelectronics and optoelectronics. They are mainly applied in the pan‑semiconductor field (wafers, display panels, solar cells) for cleaning, etching, and other wet processes during manufacturing.

In the manufacturing of wafers, display panels, and solar cells, the cleanliness of the silicon wafer surface is critical to performance, yield, and display resolution, so every manufacturing process includes a cleaning step. The role of wet chemicals is to use the corrosive and soluble properties of chemical agents to remove organic contaminants remaining on the wafer surface and reduce the residual amount of metallic impurities during the cleaning process.

What are the grades of wet electronic chemicals?

Wet electronic chemicals are key basic chemical materials in integrated circuit manufacturing and important wafer fabrication materials. The lower the metallic impurity content and the smaller the particle size of wet electronic chemicals, the more suitable they are for advanced wafer process technologies. Therefore, the core indicator of wet electronic chemicals is "purity". The International Semiconductor Equipment and Materials Industry Association (SEMI) classifies the purity grades of wet electronic chemicals based on the actual global development of these chemicals, dividing them into five grades from SEMI G1 to SEMI G5. These correspond to different technology levels of integrated circuits (chips); the higher the standard required for wet electronic chemicals, the higher the purity and cleanliness requirements.

Application fields of wet electronic chemicals

Wet electronic chemicals are mainly produced from upstream raw materials such as hydrochloric acid (HCl), sulfuric acid (H₂SO₄), hydrofluoric acid (HF), hydrogen peroxide (H₂O₂), ammonia water (NH₃·H₂O), sodium hydroxide (NaOH), potassium hydroxide (KOH), acetone, ethanol, isopropanol, etc., through processes including pretreatment, filtration, and purification. The main downstream application fields are photovoltaic solar cells, flat panel displays, and semiconductors. The main process applications include cleaning, etching, doping, photolithography, developing, wafer surface treatment, film stripping, and photoresist removal in integrated circuit manufacturing.

Table : Technical requirements and grade matching

Membrane Solutions Wet Electronic Chemical Filter Cartridge Product Recommendations

Membrane Solutions uses advanced equipment and processes to strictly control the cleanliness of filtration products, meeting the filtration needs of different customers. We offer high‑performance filter cartridges for panel and semiconductor applications, providing low‑extraction, low‑metal‑ion products to support stable, safe, and reliable production in the microelectronics industry.

Membrane Solutions has long focused on the R&D and manufacturing of high‑purity filtration products for the microelectronics field. We can provide customers in integrated circuits, display panels, photovoltaics, and other fields with filter cartridge products and integrated filtration solutions suitable for different grade requirements from G1 to G5. For application-specific electronic chemical filtration selection or technical consultation, please contact your Membrane Solutions sales engineer.