One of the biggest challenges facing semiconductor manufacturing is surface contamination of silicon wafers. Studies have shown that defects brought about by contamination cause up to 80% of the electrical failures in chips. If there are contaminants in the wafer manufacturing process that are not completely removed, it will affect the yield of the wafers, and cause a whole wafer or even batches of wafers to be scrapped. Therefore, the semiconductor cleaning technology is one of the most critical steps in the semiconductor manufacturing process. As an important part of the semiconductor process, the wet technology etches and cleans the wafer surface through chemicals (acids, alkalis, solvents, etc.) and liquid media such as ultra-pure water. See the typical wafer cleaning process below.

The filter cartridge products of Membrane Solutions can provide filtration solutions with excellent performance. Some of them are specially designed for SC1, SC2, 49HF, HN03, EKC, NMP and other liquid filtration in semiconductor wet process applications. Many application filter cartridges suitable for various liquid have been developed, which can effectively remove particles in high purity chemicals used in the semiconductor industry, and escort to improve the yield of semiconductor process wafers.

Typical Cleaning Tank Process (Take SC1 as an example)

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