Photo-Novel Series Filter Cartridge for Photoresist, Organic Solvents and Other Processes
Request a QuoteDescription
Membrane Solutions Photo-Novel series Nylon filters have high flow rate performance, good retention rate and excellent organic cleanliness. It is especially designed for photoresists, solvent and other chemicals in SEMI-Photo processes.The Nylon membrane used in Photo-Unix series filters is naturally hydrophilic nylon materials. It possesses low metal and particle cleanliness, and most important is the very low level of organic extraction.
Features
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High Efficiency
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Naturally Hydrophilic
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Excellent organic extraction cleanliness
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Manufactured in cleanroom
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100% Integrity tested
Technical Parameters
|
Materials |
Membrane |
Nylon 66 |
|
Support, Core and Cage |
HDPE/PP |
|
|
O-ring（222） |
EPDM/TEV |
|
|
Removal Rating |
2nm, 5nm, 10nm, 20nm, 30nm, 50nm, 0.1μm |
|
|
Membrane Area |
SX (φ68mm) |
0.7 m2 /10” |
|
SY (φ68mm) |
1.3 m2 /10” |
|
|
Max. Operating Conditions |
Max. Forward Differential Pressure |
0.34 MPa (49 psi) @ 25 ℃ (77 °F) |
|
Max. Reverse Differential Pressure |
0.24 MPa (34 psi) @ 25 ℃ (77 °F) |
|
|
Max. Operating Temperature |
40 ℃ (104 °F) ； |
|
|
Package |
Dry；Prewet by UPW |
|
Flow Rate VS. Differential Pressure Performance
Dimensions
Ordering Information
|
PNC |
Support Materials |
Removal Ratings |
Diameter |
End Cap |
Length |
O-ring |
Metal Cleanliness |
Package |
|
/(HDPE) P(PP) |
T (2nm) F (5nm) E (10nm) A (20nm) C (30nm) G (50nm) B (0.1μm) |
SX(φ68mm, 0.7m2 ) SY(φ68mm, 1.3m2 ) |
N(222 Flat) |
04 (4”) 10 (10”) 20 (20”) |
P (EPDM) T (TEV) |
U（＜3ug/device） R（＜25ug/device） |
D (Dry) W (UPW Prewet) |
