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Policap-Plus Point-of-Use(POU) CMP Capsule Filter
Request a QuoteProduct Description
The PoliCap-Plus series are specially designed capsule filters for advanced CMP applications, especially for CMP slurry containing collodal SiO2, CeO2 and ultrafine Al2O3 abrasives. Structurally, the convenient disposable design allows for quick installation, minimizing slurry exposure and wastage. The PoliCap-Plus series capsule The PoliCap-Plus cartridge can be used with a variety of different interfaces to meet the needs of dfferent applications.
Feature
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All-polypropylene construction for low cost.
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Disposable design for easy change-outs and minimizes exposures to the slurries.
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Low hold-up volume, to reduce slurry waste and prevent deposition.
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Flexibility in connector options.
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Low pressure drop and excellent removal efficiency.
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High contaminant holding capacity and long service life.
Specifications
Materials | Filter Layers/Support | polypropylene |
Cage/Core/End Cap | polypropylene | |
O-ring | EPDM | |
Removal Rating | 0.05μm,0.07μm,0.1μm,0.2μm,0.3μm,0.5μm,0.7μm,1.0μm,3.0μm | |
Connections | Inlet/outlet | 3/8” Flaretek1 Easy-touch |
Vent/drain | / | |
Dimensions | Outer Diameter | 93mm |
Inner Filter Diameter | 68mm | |
Lengths | 5inch | |
Max. Operating Conditions |
Max. Operating Pressure | 0.34 MPa (50 psi) @ 25 ˚C (77 ˚F) |
Max. Operating Temperature | 80 ˚C (176˚F) |