Policap-Plus Point-of-Use(POU) CMP Capsule Filter

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Product Description

The PoliCap-Plus series are specially designed capsule filters for advanced CMP applications, especially for CMP slurry containing collodal SiO2, CeO2 and ultrafine Al2Oabrasives. Structurally, the convenient disposable design allows for quick installation, minimizing slurry exposure and wastage. The PoliCap-Plus series capsule The PoliCap-Plus cartridge can be used with a variety of different interfaces to meet the needs of dfferent applications.

Feature

  • All-polypropylene construction for low cost.

  • Disposable design for easy change-outs and minimizes exposures to the slurries.

  • Low hold-up volume, to reduce slurry waste and prevent deposition.

  • Flexibility in connector options.

  • Low pressure drop and excellent removal efficiency.

  • High contaminant holding capacity and long service life.

Specifications

Materials Filter Layers/Support polypropylene
Cage/Core/End Cap polypropylene
O-ring EPDM
Removal Rating 0.05μm,0.07μm,0.1μm,0.2μm,0.3μm,0.5μm,0.7μm,1.0μm,3.0μm
Connections Inlet/outlet 3/8” Flaretek1
Easy-touch
Vent/drain /
Dimensions Outer Diameter 93mm
Inner Filter Diameter 68mm
Lengths 5inch
Max. Operating
Conditions
Max. Operating Pressure 0.34 MPa (50 psi) @ 25 ˚C (77 ˚F)
Max. Operating Temperature 80 ˚C (176˚F)
1Flaretek is a trademark of Entegris, Inc.

 Flow Rate VS. Differential Pressure Performance

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