Policap-Plus Point-of-Use(POU) CMP Capsule Filter

Membrane Solutions PoliCap-Plus point-of-use(POU) capsule is specially designed for advanced CMP applications, especially optimized for colloidal silica, ceria, and very fine alumina-based slurries. Structurally, the convenient disposable design allows for quick installation, minimizes exposures to the slurries and reduces waste. PoliCap-Plus capsules are available with melt-blown or membrane-rolled filter media, meanwhile, available with flexibility connector options. The PoliCap-Plus series are specially designed capsule filters for advanced CMP applications, especially for CMP slurry containing collodal SiO2, CeO2 and ultrafine Al2O3 abrasives. Structurally, the convenient disposable design allows for quick installation, minimizing slurry exposure and wastage. The PoliCap-Plus series capsule The PoliCap-Plus cartridge can be used with a variety of different interfaces to meet the needs of dfferent applications.
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Features

  • All-polypropylene construction for low cost.
  • Disposable design for easy change-outs and minimizes exposures to the slurries.
  • Low hold-up volume, to reduce slurry waste and prevent deposition.
  • Flexibility in connector options.
  • Low pressure drop and excellent removal efficiency.
  • High contaminant holding capacity and long service life.

Applications

 

 

Technical Parameters

Materials Filter Layers/Support polypropylene
Cage/Core/End Cap polypropylene
O-ring EPDM
Removal Rating 0.05μm,0.07μm,0.1μm,0.2μm,0.3μm,0.5μm,0.7μm,1.0μm,3.0μm
Connections Inlet/outlet 3/8” Flaretek1
Easy-touch
Vent/drain /
Dimensions Outer Diameter 93mm
Inner Filter Diameter 68mm
Lengths 5inch
Max. Operating
Conditions		 Max. Operating Pressure 0.34 MPa (50 psi) @ 25 ˚C (77 ˚F)
Max. Operating Temperature 80 ˚C (176˚F)

      1Flaretek is a trademark of Entegris, Inc.

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